Ai RF500 Series RF Generator

The Ai RF500 RF generator provides reliable 500-watt output power with a stable 13.56MHz frequency, ideal for DIY PECVD systems and applications such as plasma etching, cleaning, and polymerization. Its robust design supports up to 150mm OD tubes, ensuring versatility for a range of plasma-based processes.

Key Features:

• Power Output: Adjustable 5–500 watts with precise +/-1% step control.
• Frequency Stability: 13.56MHz with an impressive +/-0.005% accuracy.
• Automatic Matching: Seamless impedance matching for efficient operation.
• RF Output Port: 50 Ω N-type, female connector for compatibility with various systems.
• Cooling: Air-cooled system ensures stable and continuous operation.

Specifications:

• Electrical Requirements: 208-240 volts, 50/60 Hz
• Reflection Power: Up to 200 watts maximum
• Supported Tubes: Up to 150mm OD
• Construction: Durable and designed for consistent performance in demanding conditions

Applications:

• Plasma-enhanced chemical vapor deposition (PECVD)
• Plasma etching and surface modification
• Plasma cleaning and contamination removal
• Plasma polymerization for material coatings

The Ai RF500 RF generator combines precision, power, and reliability, making it a top choice for both research and industrial plasma systems.